دورية أكاديمية
Vertically self-aligned buried junction formation for ultrahigh-density DRAM applications
العنوان: | Vertically self-aligned buried junction formation for ultrahigh-density DRAM applications |
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المؤلفون: | Beintner, J., Li, Y., Knorr, A., Chidambarrao, D., Voigt, P., Divakaruni, R., Pochmuller, P., Bronner, G. |
المصدر: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 25(5):259-261 May, 2004 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 07413106 15580563 |
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DOI: | 10.1109/LED.2004.826512 |