مؤتمر
The effects of RTA processes on flow pattern defects in Czochralski silicon
العنوان: | The effects of RTA processes on flow pattern defects in Czochralski silicon |
---|---|
المؤلفون: | Hanfeng Zhang, Caichi Liu, Qigang Zhou, Jing Wang, Qiuyan Hao, Hongdi Zhang, Yangxian Li |
المصدر: | The Fourth International Workshop on Junction Technology, 2004. IWJT '04. Juction technology Junction Technology, 2004. IWJT '04. The Fourth International Workshop on. :58-61 2004 |
Relation: | Extended Abstracts of the Fourth International Workshop on Junction Technology |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780381912 9780780381919 |
---|---|
DOI: | 10.1109/IWJT.2004.1306758 |