The effects of RTA processes on flow pattern defects in Czochralski silicon

التفاصيل البيبلوغرافية
العنوان: The effects of RTA processes on flow pattern defects in Czochralski silicon
المؤلفون: Hanfeng Zhang, Caichi Liu, Qigang Zhou, Jing Wang, Qiuyan Hao, Hongdi Zhang, Yangxian Li
المصدر: The Fourth International Workshop on Junction Technology, 2004. IWJT '04. Juction technology Junction Technology, 2004. IWJT '04. The Fourth International Workshop on. :58-61 2004
Relation: Extended Abstracts of the Fourth International Workshop on Junction Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780381912
9780780381919
DOI:10.1109/IWJT.2004.1306758