مؤتمر
An improved process, metrology and methodology for shallow trench isolation etch
| العنوان: | An improved process, metrology and methodology for shallow trench isolation etch |
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| المؤلفون: | Baum, C., Gaddam, S. |
| المصدر: | 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530) Advanced semiconductor manufacturing Advanced Semiconductor Manufacturing, 2004. ASMC '04. IEEE Conference and Workshop. :93-97 2004 |
| Relation: | 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780383125 9780780383128 |
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| DOI: | 10.1109/ASMC.2004.1309543 |