Thermal cycle reliability of stacked via structures with copper metallization and an organic low-k dielectric

التفاصيل البيبلوغرافية
العنوان: Thermal cycle reliability of stacked via structures with copper metallization and an organic low-k dielectric
المؤلفون: Filippi, R.G., McGrath, J.F., Shaw, T.M., Murray, C.E., Rathore, H.S., McLaughlin, P.S., McGahay, V., Nicholson, L., Wang, P.-C., Lloyd, J.R., Lane, M., Rosenberg, R., Liu, X., Wang, Y.-Y., Landers, W., Spooner, T., Demarest, J.J., Engel, B.H., Gill, J., Goth, G., Barth, E., Biery, G., Davis, C.R., Wachnik, R.A., Goldblatt, R., Ivers, T., Swinton, A., Barile, C., Aitken, J.
المصدر: 2004 IEEE International Reliability Physics Symposium. Proceedings Reliability physics Reliability Physics Symposium Proceedings, 2004. 42nd Annual. 2004 IEEE International. :61-67 2004
Relation: 2004 IEEE International Reliability Physics Symposium. Proceedings
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078038315X
9780780383159
DOI:10.1109/RELPHY.2004.1315302