مؤتمر
MOSFET current drive optimization using silicon nitride capping layer for 65-nm technology node
العنوان: | MOSFET current drive optimization using silicon nitride capping layer for 65-nm technology node |
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المؤلفون: | Pidin, S., Mori, T., Nakamura, R., Saiki, T., Tanabe, R., Satoh, S., Kase, M., Hashimoto, K., Sugii, T. |
المصدر: | Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. VLSI technology VLSI Technology, 2004. Digest of Technical Papers. 2004 Symposium on. :54-55 2004 |
Relation: | 2004 Symposium on VLSI Technology. Digest of Technical Papers |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780382897 9780780382893 |
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DOI: | 10.1109/VLSIT.2004.1345389 |