Characteristics of PAALD-TaN thin films derived from TAIMATA precursor for copper metallization

التفاصيل البيبلوغرافية
العنوان: Characteristics of PAALD-TaN thin films derived from TAIMATA precursor for copper metallization
المؤلفون: Jong Won Hong, Kyung In Choi, You Kyoung Lee, Sung Gun Park, Sang Woo Lee, Jong Myeong Lee, Sang Bom Kang, Gil Heyun Choi, Sung Tae Kim, U-In Chung, Joo Tae Moon
المصدر: Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729) Interconnect technology Interconnect Technology Conference, 2004. Proceedings of the IEEE 2004 International. :9-11 2004
Relation: Proceedings of the IEEE 2004 International Interconnect Technology Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780383087
9780780383081
DOI:10.1109/IITC.2004.1345665