مؤتمر
Fabrication and operation of sub-50 nm strained-Si on Si/sub 1-x/Ge/sub x/ Insulator (SGOI) CMOSFETs
| العنوان: | Fabrication and operation of sub-50 nm strained-Si on Si/sub 1-x/Ge/sub x/ Insulator (SGOI) CMOSFETs |
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| المؤلفون: | Sadaka, M., Thean, A.V.-Y., Barr, A., Tekleab, D., Kalpat, S., White, T., Nguyen, T., Mora, R., Beckage, P., Jawarani, D., Zollner, S., Kottke, M., Liu, R., Canonico, M., Xie, Q.-H., Wang, X.-D., Parsons, S., Eades, D., Zavala, M., Nguyen, B.-Y., Mazure, C., Mogab, J. |
| المصدر: | 2004 IEEE International SOI Conference (IEEE Cat. No.04CH37573) SOI conference SOI Conference, 2004. Proceedings. 2004 IEEE International. :209-211 2004 |
| Relation: | 2004 IEEE International SOI Conference |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780384970 9780780384972 |
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| DOI: | 10.1109/SOI.2004.1391620 |