مؤتمر
A novel low cost 65nm CMOS process architecture with self aligned isolation and W cladded source/drain
| العنوان: | A novel low cost 65nm CMOS process architecture with self aligned isolation and W cladded source/drain |
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| المؤلفون: | Blosse, A., Ramkumar, K., Gopalan, P., Hsu, C.T., Narayanan, S., Narasimhan, G., Gettle, R., Kapre, R., Sharifzadeh, S. |
| المصدر: | IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004. Electron devices meeting Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International. :669-672 2004 |
| Relation: | 2004 International Electron Devices Meeting |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780386841 9780780386846 |
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| DOI: | 10.1109/IEDM.2004.1419256 |