مؤتمر
Etch chamber condition-based process control model for shallow trench isolation trench depth control
| العنوان: | Etch chamber condition-based process control model for shallow trench isolation trench depth control |
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| المؤلفون: | Gaddam, S., Braun, M.W. |
| المصدر: | IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI. :17-20 2005 |
| Relation: | IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing 2005. |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780389972 9780780389977 |
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| تدمد: | 10788743 23766697 |
| DOI: | 10.1109/ASMC.2005.1438760 |