Challenges in barrier and seed layers characterization of copper technology IC devices

التفاصيل البيبلوغرافية
العنوان: Challenges in barrier and seed layers characterization of copper technology IC devices
المؤلفون: Li, K., Er, E., Yeow, T., Tang, D.
المصدر: Proceedings of the 12th International Symposium on the Physical and Failure Analysis of Integrated Circuits, 2005. IPFA 2005. Physical and Failure Analysis of Integrated Circuits Physical and Failure Analysis of Integrated Circuits, 2005. IPFA 2005. Proceedings of the 12th International Symposium on the. :263-266 2005
Relation: Proceedings of the 12th International Symposium on the Physical and Failure Analysis of Integrated Circuits
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780393015
9780780393011
تدمد:19461542
19461550
DOI:10.1109/IPFA.2005.1469175