مؤتمر
Influence of Doping Profile and Halo Implantation on the Threshold Voltage Mismatch of a 0.13um CMOS Technology
| العنوان: | Influence of Doping Profile and Halo Implantation on the Threshold Voltage Mismatch of a 0.13um CMOS Technology |
|---|---|
| المؤلفون: | Croon, J.A., Augendre, E., Decoutere, S., Sansen, W., Maes, H.E. |
| المصدر: | 32nd European Solid-State Device Research Conference Solid-State Device Research Conference, 2002. Proceeding of the 32nd European. :579-582 2002 |
| Relation: | 32nd European Solid-State Device Research Conference |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 8890084782 9788890084782 |
|---|---|
| DOI: | 10.1109/ESSDERC.2002.194997 |