مؤتمر
Tunnel Oxide Optimization for Device Scaling down: Nitridation Impact on Stress Induced Leakage Current
العنوان: | Tunnel Oxide Optimization for Device Scaling down: Nitridation Impact on Stress Induced Leakage Current |
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المؤلفون: | Ghidini, G., Sebastiani, A., Brazzelli, D., Zonca, R. |
المصدر: | 31st European Solid-State Device Research Conference Solid-State Device Research Conference, 2001. Proceeding of the 31st European. :247-250 2001 |
Relation: | 31st European Solid-State Device Research Conference |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 2914601018 9782914601016 |
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DOI: | 10.1109/ESSDERC.2001.195247 |