High work-function metal gate and high-k dielectrics for charge trap flash memory device applications

التفاصيل البيبلوغرافية
العنوان: High work-function metal gate and high-k dielectrics for charge trap flash memory device applications
المؤلفون: Sanghun Jeon, Jeong Hee Han, Junghoon Lee, Cheol Jong Choi, Sangmoo Choi, Hyunsang Hwang, Chungwoo Kim
المصدر: Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005. Solid-State Device Research Conference Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European. :325-328 2005
Relation: Proceedings of ESSDERC 2005. 31st European Solid-State Device Research Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780392035
9780780392038
تدمد:19308876
23786558
DOI:10.1109/ESSDER.2005.1546651