Demonstration of recessed SiGe S/D and inserted metal gate on HfO/sub 2/ for high performance pFETs.

التفاصيل البيبلوغرافية
العنوان: Demonstration of recessed SiGe S/D and inserted metal gate on HfO/sub 2/ for high performance pFETs.
المؤلفون: Verheyen, P., Eneman, G., Rooyackers, R., Loo, R., Eeckhout, L., Rondas, D., Leys, F., Snow, J., Shamiryan, D., Demand, M., Hoffman, Th.Y., Goodwin, M., Fujimoto, H., Ravit, C., Lee, B-C., Caymax, M., De Meyer, K., Absil, P., Jurczak, M., Biesemans, S.
المصدر: IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest. International Electron Devices Meeting 2005 Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International. :886-889 2005
Relation: International Electron Devices Meeting 2005
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078039268X
9780780392687
تدمد:01631918
2156017X
DOI:10.1109/IEDM.2005.1609500