InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

التفاصيل البيبلوغرافية
العنوان: InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides
المؤلفون: Liu, B., Landesman, J.-P., Leclercq, J.-L., Rhallabi, A., Avella, M., Gonzalez, M.A., Jimenez, J., Guilet, S., Cardinaud, C., Pommereau, F.
المصدر: 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings Indium Phosphide and Related Materials Indium Phosphide and Related Materials Conference Proceedings, 2006 International Conference on. :278-281 2006
Relation: 2006 International Conference on Indium Phosphide and Related Materials Conference Proceedings
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780395581
9780780395589
تدمد:10928669
DOI:10.1109/ICIPRM.2006.1634168