High and Hyper NA Immersion Lithography using Advanced Patterning Film APF TM

التفاصيل البيبلوغرافية
العنوان: High and Hyper NA Immersion Lithography using Advanced Patterning Film APF TM
المؤلفون: van der Reijden, M.J., Op de Beeck, M., Sleeckx, E., Jaenen, P., Kunnen, E., Degroote, B., Wendy Yeh, Schreutelkamp, R.
المصدر: The 17th Annual SEMI/IEEE ASMC 2006 Conference Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE. :39-43 2006
Relation: The 17th Annual SEMI/IEEE ASMC 2006 Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:1424402549
9781424402540
تدمد:10788743
23766697
DOI:10.1109/ASMC.2006.1638721