دورية أكاديمية
Process and device characterization for a 30-GHz f/sub T/ submicrometer double poly-Si bipolar technology using BF/sub 2/-implanted base with rapid thermal process
| العنوان: | Process and device characterization for a 30-GHz f/sub T/ submicrometer double poly-Si bipolar technology using BF/sub 2/-implanted base with rapid thermal process |
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| المؤلفون: | Yamaguchi, T., Uppili, S., Lee, J.S., Kawamoto, G.H., Dosluoglu, T., Simpkins, S. |
| المصدر: | IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 40(8):1484-1495 Aug, 1993 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
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