مؤتمر
Accurate and efficient two-dimensional modeling of boron implantation into single-crystal silicon
| العنوان: | Accurate and efficient two-dimensional modeling of boron implantation into single-crystal silicon |
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| المؤلفون: | Klein, K.M., Park, C., Yang, S.-H., Tasch, A.F. |
| المصدر: | International Electron Devices Meeting 1991 [Technical Digest] Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International. :697-700 1991 |
| Relation: | 1991 International Electron Devices Meeting |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780302435 9780780302433 |
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| تدمد: | 01631918 |
| DOI: | 10.1109/IEDM.1991.235327 |