مؤتمر
Reliability of ALD Hf-based High K Gate Stacks with Optimized Interfacial Layer and Pocket Implant Engineering
| العنوان: | Reliability of ALD Hf-based High K Gate Stacks with Optimized Interfacial Layer and Pocket Implant Engineering |
|---|---|
| المؤلفون: | Mao, A. Y., Lin, W. M., Yang, C. W., Hsieh, Y. S., Cheng, L. W., Lee, G. D., Tsai, C. T., Chung, S. S., Ma, G. H. |
| المصدر: | 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) VLSI Technology, Systems and Applications, 2007. VLSI-TSA 2007. International Symposium on. :1-2 Apr, 2007 |
| Relation: | 2007 International Symposium on VLSI Technology, Systems and Applications |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 142440584X 9781424405848 1424405858 9781424405855 |
|---|---|
| تدمد: | 1524766X |
| DOI: | 10.1109/VTSA.2007.378915 |