مؤتمر
Optimizing ALD WN Process for 65nm Node CMOS Contact Application
| العنوان: | Optimizing ALD WN Process for 65nm Node CMOS Contact Application |
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| المؤلفون: | Chen, Y.-C., Hung, T.-Y., Chang, Y.-L., Shieh, K., Hsu, C.-L., Huang, C., Yan, WH, Ashtiani, K., Pisharoty, D., Lei, W., Chang, S., Huang, F., Collins, J., Tzou, S. F. |
| المصدر: | 2007 IEEE International Interconnect Technology Conferencee International Interconnect Technology Conference, IEEE 2007. :105-107 Jun, 2007 |
| Relation: | 2007 IEEE International Interconnect Technology Conferencee |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 142441069X 9781424410699 1424410703 9781424410705 |
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| تدمد: | 2380632X 23806338 |
| DOI: | 10.1109/IITC.2007.382361 |