مؤتمر
The Quantum Confined Stark Effect in Ge/SiGe Quantum Wells: An efficient electroabsorption mechanism for silicon-based applications
| العنوان: | The Quantum Confined Stark Effect in Ge/SiGe Quantum Wells: An efficient electroabsorption mechanism for silicon-based applications |
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| المؤلفون: | Roth, Jonathan E., Fidaner, Onur, Schaevitz, Rebecca K., Edwards, Elizabeth H., Kuo, Yu-Hsuan, Kamins, Theodore I., Harris, James S., Miller, David A. B. |
| المصدر: | 2007 4th IEEE International Conference on Group IV Photonics Group IV Photonics, 2007 4th IEEE International Conference on. :1-3 Sep, 2007 |
| Relation: | 2007 4th IEEE International Conference on Group IV Photonics |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424409341 9781424409358 |
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| تدمد: | 19492081 1949209X |
| DOI: | 10.1109/GROUP4.2007.4347709 |