دورية أكاديمية
Critical Dimension Uniformity Via Real-Time Photoresist Thickness Control
| العنوان: | Critical Dimension Uniformity Via Real-Time Photoresist Thickness Control |
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| المؤلفون: | Ho, W. K., Tay, A., Chen, M., Fu, J., Lu, H., Shan, X. |
| المصدر: | IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 20(4):376-380 Nov, 2007 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 08946507 15582345 |
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| DOI: | 10.1109/TSM.2007.907610 |