مؤتمر
Highly Reliable Rapid Thermal Selective Gate Re-Oxidation Process of Advanced Metal Gate Stacks with Tungsten Electrode
| العنوان: | Highly Reliable Rapid Thermal Selective Gate Re-Oxidation Process of Advanced Metal Gate Stacks with Tungsten Electrode |
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| المؤلفون: | Niess, J., Kirchner, C., Dietl, W., Meyer, H.-J., Nadig, B., Lerch, W., Costina, I., Kurps, R., Bolze, D. |
| المصدر: | 2007 15th International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on. :209-214 Oct, 2007 |
| Relation: | 2007 15th International Conference on Advanced Thermal Processing of Semiconductors |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424412273 9781424412280 |
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| تدمد: | 19440251 1944026X |
| DOI: | 10.1109/RTP.2007.4383844 |