Selective Rapid Thermal Oxidation of Silicon vs. Tungsten using Oxygen in Hydrogen

التفاصيل البيبلوغرافية
العنوان: Selective Rapid Thermal Oxidation of Silicon vs. Tungsten using Oxygen in Hydrogen
المؤلفون: Ripley, Martin, Balasubramanian, Ramachandran, Tam, Norman, Yokota, Yoshitaka, Lee, An Bae, Kim, Tae Jung, Lee, Chung Hun
المصدر: 2007 15th International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on. :215-221 Oct, 2007
Relation: 2007 15th International Conference on Advanced Thermal Processing of Semiconductors
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424412273
9781424412280
تدمد:19440251
1944026X
DOI:10.1109/RTP.2007.4383845