مؤتمر
45nm High-k/Metal-Gate CMOS Technology for GPU/NPU Applications with Highest PFET Performance
العنوان: | 45nm High-k/Metal-Gate CMOS Technology for GPU/NPU Applications with Highest PFET Performance |
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المؤلفون: | Huang, H.T., Liu, Y.C., Hou, Y.T., Chen, R. C-J, Lee, C.H., Chao, Y.S., Hsu, P.F., Chen, C.L., Guo, W.H., Yang, W.C., Perng, T.H., Shen, J.J., Yasuda, Y., Goto, K., Chen, C.C., Huang, K.T., Chuang, H., Diaz, C.H., Liang, M.S. |
المصدر: | 2007 IEEE International Electron Devices Meeting Electron Devices Meeting, 2007. IEDM 2007. IEEE International. :285-288 Dec, 2007 |
Relation: | 2007 IEEE International Electron Devices Meeting |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424415076 9781424415083 |
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تدمد: | 01631918 2156017X |
DOI: | 10.1109/IEDM.2007.4418924 |