45nm High-k/Metal-Gate CMOS Technology for GPU/NPU Applications with Highest PFET Performance

التفاصيل البيبلوغرافية
العنوان:	45nm High-k/Metal-Gate CMOS Technology for GPU/NPU Applications with Highest PFET Performance
المؤلفون:	Huang, H.T., Liu, Y.C., Hou, Y.T., Chen, R. C-J, Lee, C.H., Chao, Y.S., Hsu, P.F., Chen, C.L., Guo, W.H., Yang, W.C., Perng, T.H., Shen, J.J., Yasuda, Y., Goto, K., Chen, C.C., Huang, K.T., Chuang, H., Diaz, C.H., Liang, M.S.
المصدر:	2007 IEEE International Electron Devices Meeting Electron Devices Meeting, 2007. IEDM 2007. IEEE International. :285-288 Dec, 2007
Relation:	2007 IEEE International Electron Devices Meeting
قاعدة البيانات:	IEEE Xplore Digital Library