مؤتمر
A 45nm NOR Flash Technology with Self-Aligned Contacts and 0.024μm2 Cell Size for Multi-level Applications
| العنوان: | A 45nm NOR Flash Technology with Self-Aligned Contacts and 0.024μm2 Cell Size for Multi-level Applications |
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| المؤلفون: | Fastow, R., Banerjee, R., Bjeletich, P., Brand, A., Chao, H., Gorman, J., Guo, X., Heng, J.B., Koenigsfeld, N., Ma, S., Masad, A., Soss, S., Woo, B.J. |
| المصدر: | 2008 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) VLSI Technology, Systems and Applications, 2008. VLSI-TSA 2008. International Symposium on. :81-82 Apr, 2008 |
| Relation: | 2008 International Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424416141 9781424416158 |
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| تدمد: | 1524766X |
| DOI: | 10.1109/VTSA.2008.4530808 |