مؤتمر
Analysis of interconnect sensitivity to process variation in 90nm
العنوان: | Analysis of interconnect sensitivity to process variation in 90nm |
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المؤلفون: | Jiang Lifei, Sun Lingling, Zhou Lei |
المصدر: | 2008 2nd IEEE International Nanoelectronics Conference Nanoelectronics Conference, 2008. INEC 2008. 2nd IEEE International. :798-801 Mar, 2008 |
Relation: | 2008 2nd IEEE International Nanoelectronics Conference (NEC) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424415724 9781424415731 |
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تدمد: | 21593523 21593531 |
DOI: | 10.1109/INEC.2008.4585604 |