مؤتمر
A new direct low-k/Cu dual damascene (DD) contact lines for low-loss (LL) CMOS device platforms
| العنوان: | A new direct low-k/Cu dual damascene (DD) contact lines for low-loss (LL) CMOS device platforms |
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| المؤلفون: | Kawahara, J., Ueki, M., Tagami, M., Yako, K., Yamamoto, H., Ito, F., Nagase, H., Saito, S., Furutake, N., Onodera, T., Takeuchi, T., Nakamura, H., Arita, K., Motoyama, K., Nakazawa, E., Fujii, K., Sekine, M., Okada, N., Hayashi, Y. |
| المصدر: | 2008 Symposium on VLSI Technology VLSI Technology, 2008 Symposium on. :106-107 Jun, 2008 |
| Relation: | 2008 Symposium on VLSI Technology |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424418022 9781424418039 |
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| تدمد: | 07431562 21589682 |
| DOI: | 10.1109/VLSIT.2008.4588580 |