Origin of local temperature variation during spike anneal and millisecond anneal

التفاصيل البيبلوغرافية
العنوان: Origin of local temperature variation during spike anneal and millisecond anneal
المؤلفون: Beneyton, R., Colin, A., Bono, H., Cacho, F., Bidaud, M., Dumont, B., Morin, P., Barla, K.
المصدر: 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2008. RTP 2008. 16th IEEE International Conference on. :183-193 Sep, 2008
Relation: 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424419500
9781424419517
تدمد:19440251
1944026X
DOI:10.1109/RTP.2008.4690554