مؤتمر
Origin of local temperature variation during spike anneal and millisecond anneal
العنوان: | Origin of local temperature variation during spike anneal and millisecond anneal |
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المؤلفون: | Beneyton, R., Colin, A., Bono, H., Cacho, F., Bidaud, M., Dumont, B., Morin, P., Barla, K. |
المصدر: | 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2008. RTP 2008. 16th IEEE International Conference on. :183-193 Sep, 2008 |
Relation: | 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424419500 9781424419517 |
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تدمد: | 19440251 1944026X |
DOI: | 10.1109/RTP.2008.4690554 |