Modeling of Be diffusion in InGaAs epitaxial layers using two approaches: Boltzmann-Matano technique and point defect nonequilibrium

التفاصيل البيبلوغرافية
العنوان: Modeling of Be diffusion in InGaAs epitaxial layers using two approaches: Boltzmann-Matano technique and point defect nonequilibrium
المؤلفون: Marcon, J., Koumetz, S., Ketata, K., Ketata, M., Launay, P.
المصدر: Proceedings of 8th International Conference on Indium Phosphide and Related Materials Indium phosphide and related materials Indium Phosphide and Related Materials, 1996. IPRM '96., Eighth International Conference on. :706-709 1996
Relation: Proceedings of 8th International Conference on Indium Phosphide and Related Materials
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780332830
9780780332836
DOI:10.1109/ICIPRM.1996.492392