Single step PVD planarized aluminum interconnect with low-/spl epsiv/ organic ILD for high performance and low cost ULSI

التفاصيل البيبلوغرافية
العنوان: Single step PVD planarized aluminum interconnect with low-/spl epsiv/ organic ILD for high performance and low cost ULSI
المؤلفون: Zhao, B., Biberger, A., Hoffman, V., Wang, S.-Q., Vasudev, P.k., Seidel, T.E.
المصدر: 1996 Symposium on VLSI Technology. Digest of Technical Papers VLSI technology VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on. :72-73 1996
Relation: 1996 Symposium on VLSI Technology. Digest of Technical Papers
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078033342X
9780780333420
DOI:10.1109/VLSIT.1996.507797