مؤتمر
Etch adjustment for independent CD control in Double Patterning
| العنوان: | Etch adjustment for independent CD control in Double Patterning |
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| المؤلفون: | Barnola, Sebastien, Lapeyre, Celine, Servin, Isabelle, McCallum, Martin, Magoon, Holly |
| المصدر: | 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI. :66-69 May, 2009 |
| Relation: | 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424436149 9781424436156 |
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| تدمد: | 10788743 23766697 |
| DOI: | 10.1109/ASMC.2009.5155955 |