مؤتمر
Etch adjustment for independent CD control in Double Patterning
العنوان: | Etch adjustment for independent CD control in Double Patterning |
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المؤلفون: | Barnola, Sebastien, Lapeyre, Celine, Servin, Isabelle, McCallum, Martin, Magoon, Holly |
المصدر: | 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI. :66-69 May, 2009 |
Relation: | 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424436149 9781424436156 |
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تدمد: | 10788743 23766697 |
DOI: | 10.1109/ASMC.2009.5155955 |