مؤتمر
Neutral etching and shadowing in trench etching of semiconductors
العنوان: | Neutral etching and shadowing in trench etching of semiconductors |
---|---|
المؤلفون: | Abraham-Shrauner, B., Wang, C.D. |
المصدر: | International Conference on Plasma Science (papers in summary form only received) Plasma science Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on. :164 1995 |
Relation: | International Conference on Plasma Science (papers in summary form only received) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780326695 9780780326699 |
---|---|
تدمد: | 07309244 |
DOI: | 10.1109/PLASMA.1995.531627 |