مؤتمر
Neutral etching and shadowing in trench etching of semiconductors
| العنوان: | Neutral etching and shadowing in trench etching of semiconductors |
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| المؤلفون: | Abraham-Shrauner, B., Wang, C.D. |
| المصدر: | International Conference on Plasma Science (papers in summary form only received) Plasma science Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on. :164 1995 |
| Relation: | International Conference on Plasma Science (papers in summary form only received) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780326695 9780780326699 |
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| تدمد: | 07309244 |
| DOI: | 10.1109/PLASMA.1995.531627 |