مؤتمر
Homogeneity check of ion implantation in silicon by wide-angle ellipsometry
| العنوان: | Homogeneity check of ion implantation in silicon by wide-angle ellipsometry |
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| المؤلفون: | Fried, M., Juhasz, G., Major, C., Petrik, P., Battistig, G. |
| المصدر: | 2009 17th International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2009. RTP '09. 17th International Conference on. :1-4 Sep, 2009 |
| Relation: | 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424438143 9781424438150 |
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| تدمد: | 19440251 1944026X |
| DOI: | 10.1109/RTP.2009.5373448 |