مؤتمر
Homogeneity check of ion implantation in silicon by wide-angle ellipsometry
العنوان: | Homogeneity check of ion implantation in silicon by wide-angle ellipsometry |
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المؤلفون: | Fried, M., Juhasz, G., Major, C., Petrik, P., Battistig, G. |
المصدر: | 2009 17th International Conference on Advanced Thermal Processing of Semiconductors Advanced Thermal Processing of Semiconductors, 2009. RTP '09. 17th International Conference on. :1-4 Sep, 2009 |
Relation: | 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424438143 9781424438150 |
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تدمد: | 19440251 1944026X |
DOI: | 10.1109/RTP.2009.5373448 |