مؤتمر
A Novel “hybrid” high-k/metal gate process for 28nm high performance CMOSFETs
| العنوان: | A Novel “hybrid” high-k/metal gate process for 28nm high performance CMOSFETs |
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| المؤلفون: | Lai, C. M., Lin, C. T., Cheng, L. W., Hsu, C. H., Tseng, J. T., Chiang, T. F., Chou, C. H., Chen, Y. W., Yu, C. H., Hsu, S. H., Chen, C. G., Lee, Z. C., Lin, J. F., Yang, C. L., Ma, G. H., Chien, S. C. |
| المصدر: | 2009 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2009 IEEE International. :1-4 Dec, 2009 |
| Relation: | 2009 IEEE International Electron Devices Meeting (IEDM) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424456406 9781424456390 9781424456413 |
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| تدمد: | 01631918 2156017X |
| DOI: | 10.1109/IEDM.2009.5424256 |