Formation of SiGe Alloy Layers in SIMOX Substrates by Ge+ Implantation

التفاصيل البيبلوغرافية
العنوان: Formation of SiGe Alloy Layers in SIMOX Substrates by Ge+ Implantation
المؤلفون: Chen, N. X., Gong, L., Schork, R., Yuan, J.M., Ryssel, H.
المصدر: ESSDERC '94: 24th European Solid State Device Research Conference Solid State Device Research Conference, 1994. ESSDERC '94. 24th European. :737-740 Sep, 1994
Relation: Proceedings of the 24th European Solid State Device Research Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:2863321579
9782863321577