A novel 0.25 /spl mu/m shallow trench isolation technology

التفاصيل البيبلوغرافية
العنوان: A novel 0.25 /spl mu/m shallow trench isolation technology
المؤلفون: Chen, C., Chou, J.W., Lur, W., Sun, S.W.
المصدر: International Electron Devices Meeting. Technical Digest Electron devices Electron Devices Meeting, 1996. IEDM '96., International. :837-840 1996
Relation: International Electron Devices Meeting. Technical Digest
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780333934
9780780333932
تدمد:01631918
DOI:10.1109/IEDM.1996.554110