3D source/drain doping optimization in Multi-Channel MOSFET

التفاصيل البيبلوغرافية
العنوان: 3D source/drain doping optimization in Multi-Channel MOSFET
المؤلفون: Tachi, K., Vulliet, N., Barraud, S., Guillaumot, B., Maffini-Alvaro, V., Vizioz, C., Arvet, C., Campidelli, Y., Gautier, P., Hartmann, J.M., Skotnicki, T., Cristoloveanu, S., Iwai, H., Faynot, O., Ernst, T.
المصدر: 2010 Proceedings of the European Solid State Device Research Conference Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European. :368-371 Sep, 2010
Relation: ESSDERC 2010 - 40th European Solid State Device Research Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424466580
9781424466603
9781424466610
تدمد:19308876
23786558
DOI:10.1109/ESSDERC.2010.5618209