دورية أكاديمية

Integration of $\hbox{LaLuO}_{3} \ (\kappa \sim \hbox{30})$ as High-$\kappa$ Dielectric on Strained and Unstrained SOI MOSFETs With a Replacement Gate Process

التفاصيل البيبلوغرافية
العنوان: Integration of $\hbox{LaLuO}_{3} \ (\kappa \sim \hbox{30})$ as High-$\kappa$ Dielectric on Strained and Unstrained SOI MOSFETs With a Replacement Gate Process
المؤلفون: Durgun Ozben, E., Lopes, J.M.J., Nichau, A., Schnee, M., Lenk, S., Besmehn, A., Bourdelle, K.K., Zhao, Q.T., Schubert, J., Mantl, S.
المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 32(1):15-17 Jan, 2011
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:07413106
15580563
DOI:10.1109/LED.2010.2089423