دورية أكاديمية

A novel stack structure to improve the degradation of W-polycide gated MOS device with undoped a-Si/heavily-doped poly-Si multilayer

التفاصيل البيبلوغرافية
العنوان: A novel stack structure to improve the degradation of W-polycide gated MOS device with undoped a-Si/heavily-doped poly-Si multilayer
المؤلفون: Kan-Yuan Lee, Yean-Kuen Fang, Chii-Wen Chen, Mong-Song Liang, Jang-Cheng Hsieh
المصدر: IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 18(5):181-183 May, 1997
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:07413106
15580563
DOI:10.1109/55.568755