Diffusion barrier properties of atomic layer deposited iridium thin films on the Cu/Ir/Si structure

التفاصيل البيبلوغرافية
العنوان: Diffusion barrier properties of atomic layer deposited iridium thin films on the Cu/Ir/Si structure
المؤلفون: Yong Hwan Lim, Hana Yoo, Bum Ho Choi, Lee, Jong Ho, Ho-Nyun Lee, Hong Kee Lee
المصدر: 10th IEEE International Conference on Nanotechnology Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on. :594-597 Aug, 2010
Relation: 2010 IEEE 10th Conference on Nanotechnology (IEEE-NANO)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424470310
9781424470334
9781424470327
تدمد:19449399
19449380
DOI:10.1109/NANO.2010.5697930