مؤتمر
Correlation between dielectric traps and BTI characteristics of high-k/ metal gate MOSFETs
العنوان: | Correlation between dielectric traps and BTI characteristics of high-k/ metal gate MOSFETs |
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المؤلفون: | Yang, J.Q., Yang, J.F., Kang, J.F., Liu, X.Y., Han, R.Q., Kirsch, P., Tseng, H.-H., Jammy, R. |
المصدر: | 2010 IEEE International Integrated Reliability Workshop Final Report Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International. :17-21 Oct, 2010 |
Relation: | 2010 IEEE International Integrated Reliability Workshop (IIRW) |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 9781424485215 9781424485239 9781424485246 |
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تدمد: | 19308841 23748036 |
DOI: | 10.1109/IIRW.2010.5706475 |