Effect of reservoir on electromigration of short interconnects

التفاصيل البيبلوغرافية
العنوان: Effect of reservoir on electromigration of short interconnects
المؤلفون: Lamontagne, P., Ney, D., Wouters, Y.
المصدر: 2010 IEEE International Integrated Reliability Workshop Final Report Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International. :46-50 Oct, 2010
Relation: 2010 IEEE International Integrated Reliability Workshop (IIRW)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424485215
9781424485239
9781424485246
تدمد:19308841
23748036
DOI:10.1109/IIRW.2010.5706484