التفاصيل البيبلوغرافية
| العنوان: |
A dual-poly (n+/p+) gate, Ti-salicide, double-metal technology for submicron CMOS ASIC and logic applications |
| المؤلفون: |
Sun, S.W., Swenson, M., Yeargain, J.R., Lee, C.-O., Swift, C., Pfiester, J.R., Bibeau, W., Atwell, W. |
| المصدر: |
1989 Proceedings of the IEEE Custom Integrated Circuits Conference Custom Integrated Circuits Conference, 1989., Proceedings of the IEEE 1989. :18.7/1-18.7/4 1989 |
| Relation: |
1989 Proceedings of the IEEE Custom Integrated Circuits Conference |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
