التفاصيل البيبلوغرافية
| العنوان: |
A 0.5 μm fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography |
| المؤلفون: |
Moy, D., Wang, L.K., Seeger, D.E., Silverman, J.P., Hu, C.K., Kaufman, F.B., Ray, A.K., Jaso, M.A., Mazzeo, N.J. |
| المصدر: |
Digest of Technical Papers.1990 Symposium on VLSI Technology VLSI Technology, 1990. Digest of Technical Papers.1990 Symposium on. :9-10 1990 |
| Relation: |
1990 Symposium on VLSI Technology |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
