مؤتمر
Removal of hydrogen from 2H::Si(100) by sputtering and recoil implantation
| العنوان: | Removal of hydrogen from 2H::Si(100) by sputtering and recoil implantation |
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| المؤلفون: | Tesauro, M.R., Underwood, G., Lowell, J., Campion, A. |
| المصدر: | Proceedings of 11th International Conference on Ion Implantation Technology Ion implantation technology Ion Implantation Technology. Proceedings of the 11th International Conference on. :591-594 1996 |
| Relation: | Proceedings of 11th International Conference on Ion Implantation Technology |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 078033289X 9780780332898 |
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| DOI: | 10.1109/IIT.1996.586468 |