Characterization of MOS transistors integrated on high resistivity silicon with a DSSD process

التفاصيل البيبلوغرافية
العنوان: Characterization of MOS transistors integrated on high resistivity silicon with a DSSD process
المؤلفون: Batignani, G., Forti, F., Giorgi, M., Rampino, G., Tritto, S., Bosisio, L., Della Marina, R.
المصدر: 1996 IEEE Nuclear Science Symposium. Conference Record Nuclear science and medical imaging Nuclear Science Symposium, 1996. Conference Record., 1996 IEEE. 1:407-411 vol.1 1996
Relation: 1996 IEEE Nuclear Science Symposium. Conference Record
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780335341
9780780335349
تدمد:10823654
DOI:10.1109/NSSMIC.1996.591012