Fundamental study of atomic layer deposition in and on porous low-k films

التفاصيل البيبلوغرافية
العنوان: Fundamental study of atomic layer deposition in and on porous low-k films
المؤلفون: Verdonck, P., Delabie, A., Swerts, J., Farrell, L., Baklanov, M.R., Tielens, H., Van Besien, E., Witters, J., Nyns, L., Van Elshocht, S.
المصدر: 2011 IEEE International Interconnect Technology Conference Interconnect Technology Conference and 2011 Materials for Advanced Metallization (IITC/MAM), 2011 IEEE International. :1-3 May, 2011
Relation: Joint 2011 IEEE International Interconnect Technology Conference (IITC) & 2011 Materials for Advanced Metallization (MAM)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781457705038
9781457705014
9781457705021
تدمد:2380632X
23806338
DOI:10.1109/IITC.2011.5940307