مؤتمر
Study of plasma in bias pluse duty ratio at ICP etch chamber
| العنوان: | Study of plasma in bias pluse duty ratio at ICP etch chamber |
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| المؤلفون: | Tae-Hoon Jo, Myoung-Soo Yun, Bu-Il Jeon, GwangSup Cho, Gi-Chung kwon, Jang-Hoon Choi, Dong-Jin Kim, Chang-Kil Nam |
| المصدر: | 2011 Abstracts IEEE International Conference on Plasma Science Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on. :1-1 Jun, 2011 |
| Relation: | 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781612843285 9781612843308 9781612843292 |
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| تدمد: | 07309244 |
| DOI: | 10.1109/PLASMA.2011.5993306 |