Study of black silicon obtained by deep reactive ion etching - approach to achieving the hot spot of a thermoelectric energy harvester

التفاصيل البيبلوغرافية
العنوان: Study of black silicon obtained by deep reactive ion etching - approach to achieving the hot spot of a thermoelectric energy harvester
المؤلفون: Nguyen, K.N, Abi-Saab, D., Malak, M., Basset, P., Richalot, E., Pavy, N., Flourens, F., Marty, F., Angelescu, D., Leprince-Wang, Y., Bourouina, T.
المصدر: 2011 Symposium on Design, Test, Integration & Packaging of MEMS/MOEMS (DTIP) Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 2011 Symposium on. :81-84 May, 2011
Relation: 2011 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781612849058
9782355000140
9782355000157